Record number :
997934
Title of article :
An X-ray photoelectron spectroscopic study of electrochemically deposited Fe–P thin films on copper substrate
Author/Authors :
C.L Aravinda، نويسنده , , Parthasarathi Bera، نويسنده , , V Jayaram، نويسنده , , S.M. Mayanna، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2002
Pages :
10
From page :
128
To page :
137
Abstract :
Electrochemically deposited Fe–P magnetic thin film from acidic tartarate complex bath solution was characterized by X-ray photoelectron spectroscopy. As-prepared film contains both Fe3+- and P5+-like species, whereas the same film after 10 and 20 min sputtering shows peaks corresponding to Fe metal as well as Pδ− species along with P5+ species. The film after heat-treatment contains Fe3+ together with P5+ and Pδ− species, whereas heat-treated film after sputtering shows the presence of both Fe metal and Fe2+ species. There is an increase in Pδ− intensity on sputtering the heat-treated film.
Keywords :
Fe–P thin film , Electrodeposition , X-ray photoelectron spectroscopy , X-ray diffraction , Magnetic properties
Journal title :
Applied Surface Science
Serial Year :
2002
Link To Document :
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