Record number :
2094647
Title of article :
Chemical vapor deposition of hexagonal boron nitride films in the reduced pressure
Author/Authors :
Choi، نويسنده , , Byung-jin، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Pages :
6
From page :
2215
To page :
2220
Abstract :
Hexagonal boron nitride (h-BN) films were deposited onto a graphite substrate in reduced pressure by reacting ammonia and boron tribromide at 800–1200°C. The growth rate of h-BN films was dependent on the substrate temperature and the total pressures. The growth rate increased with increasing the substrate temperature at the pressure of 2 kPa, while it showed a maximum value at the pressures of 4 and 8 kPa. The temperature at which the maximum growth rate occurs decreased with increasing total pressure. With increasing the substrate temperature and total pressure, the apparent grain size increased and the surface morphology showed a rough, cauliflower-like structure.
Keywords :
A. Ceramics , D. Microstructure , A. Nitrides , B. vapor deposition
Journal title :
Materials Research Bulletin
Journal title :
Materials Research Bulletin
Serial Year :
1999
Link To Document :
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