Usoltsev، نويسنده , , Kenneth I. and Eichler، نويسنده , , R. and Dressler، نويسنده , , R. and Piguet، نويسنده , , D. and Wittwer، نويسنده , , D. and Türler، نويسنده , , A. and Brütsch، نويسنده , , R. and Olsen، نويسنده , , E.A. and Omtvedt، نويسنده , , J.P. and Semchenkov، نويسنده , , A.، نويسنده ,
A new method of intermetallic target preparation is described. Based on the molecular plating technique followed by “coupled reduction”, this method allows producing stable and homogeneous metallic targets for high intensity irradiations. In the first step, the target material is electroplated on a noble metal surface, ensuring homogeneous distribution of the desired element on the target backing. In the second step, the foil with the plated material is heated in a hydrogen flow. Due to the formation of an intermetallic compound with the noble metal support, reduction of the target material with hydrogen at high temperatures becomes thermodynamically possible.
es of all six investigated elements (U, Th, Am, Gd, Nd, and Eu) were electroplated with excellent yields on Pd backing foils by the molecular plating technique and completely reduced in hydrogen atmosphere. A homogeneous distribution of the target material over the whole thickness of the Pd foil was observed suggesting a pronounced diffusion of the reduced metals into the backing material already during the reduction process. A first test irradiation experiment with a thin 3.5 μm U/Pd intermetallic target is described.
Electrodeposition , Lanthanides , diffusion , actinides , Intermetallic , Target