Record number :
1807374
Title of article :
Correlation between process parameters, microstructure and hardness of titanium nitride films by chemical vapor deposition
Author/Authors :
Cheng، نويسنده , , Hsyien-Chia Wen، نويسنده , , Yao-Wei، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Pages :
7
From page :
103
To page :
109
Abstract :
Titanium nitride (TiN) films were grown on graphite and cemented carbide substrates by conventional chemical vapor deposition. The growth characteristics, microstructure and hardness of TiN films were evaluated. It was found that the preferred orientations and morphology of the TiN films are related to the deposition temperature and gas concentration. Lower deposition temperature favors the formation of twinned crystals and results in (2 1 1) textured film whereas higher deposition temperature favors twin-free crystals and results in (1 0 0) textured film. The hardness of TiN films depends on the film morphology and microstructure. The films with lower porosity, smaller grain size, and composed of a mixture of different types of crystals possess higher hardness. The hardness is over 2000 Hv0.1 for films with a mixture of very fine lenticular-like crystals and pyramid crystals.
Keywords :
Titanium nitride , Hardness , chemical vapor deposition , morphology , microstructure
Journal title :
Surface and Coatings Technology
Journal title :
Surface and Coatings Technology
Serial Year :
2004
Link To Document :
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