Record number :
Title of article :
Annealing studies of TiN films deposited by plasma-assisted CVD
Author/Authors :
Cheng، نويسنده , , Zhao Feng Peng، نويسنده , , Hong-rui and Xie، نويسنده , , Guang-wen and Shi، نويسنده , , Yu-long، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
From page :
To page :
Abstract :
Titanium nitride films prepared by plasma-assisted chemical vapor deposition (PACVD) on high speed steel were heated in the range of 1073–1373 K. The samples were analyzed by microhardness, XRD, EDX, SEM and XPS. It was found that the annealing temperatures had significant effects on the composition, microstructure and mechanical properties of the films. The chlorine content and lattice parameters of the films were reduced with the rise of the annealing temperature. The microhardness of the films had a minimal value at the annealing temperature of 1173 K. These results were interpreted in terms of the changes of microstructures of the PACVD TiN films.
Keywords :
Plasma-assisted CVD , TiN Film , annealing treatment
Journal title :
Surface and Coatings Technology
Journal title :
Surface and Coatings Technology
Serial Year :
Link To Document :