Record number :
1686185
Title of article :
The local adsorption of pyridine on Si(100) a combined PES and XPD study
Author/Authors :
Weier، نويسنده , , D. and Lühr، نويسنده , , T. and Beimborn، نويسنده , , A. and Schِnbohm، نويسنده , , F. and Dِring، نويسنده , , S. and Berges، نويسنده , , U. and Westphal، نويسنده , , C.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2011
Pages :
7
From page :
1784
To page :
1790
Abstract :
The chemical and geometrical properties of the system pyridine on Si(100) are investigated in a combined photoelectron spectroscopy (XPS) and photoelectron diffraction (XPD) study. Synchrotron radiation was applied to achieve high spectral resolution and a high surface sensitivity. Our studies were performed at saturation coverage of pyridine on silicon. The XPS and XPD results, including diffraction patterns for all spectral resolved components, clearly show that pyridine is reacting with silicon dimer atoms of the (2 × 1)-reconstructed surface. We propose a tetra-σ-bonded structure model and provide detailed structure parameters.
Keywords :
pyridine , Organic–semiconductor interface , Photoelectron spectroscopy , Photoelectron diffraction , Silicon
Journal title :
Surface Science
Link To Document :