Record number :
1311579
Title of article :
The porous silicon morphology effect on the growth of electrodeposited FeNi alloy Original Research Article
Author/Authors :
S. Ouir، نويسنده , , G. Fortas، نويسنده , , S. Sam، نويسنده , , H. Aliouat، نويسنده , , A. Manseri، نويسنده , , Y. Belaroussi، نويسنده , , N. Gabouze*، نويسنده , , A.Y. Khereddine، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2012
Pages :
5
From page :
391
To page :
395
Abstract :
In this work, we report on cathodic deposition of FeNi thin films into porous silicon (PS) formed on n-type Si. Macroporous and mesoporous silicon layers were formed at constant potential or current density. The electrodeposited thin films were characterized by Energy Dispersive Spectroscopy (EDS) and X-Ray Diffraction (XRD). The magnetic properties of the FeNi layers were investigated by hysteresis loops measurements. SEM images of the FeNi films indicate that tubular and granular forms were obtained depending on the porous silicon surface morphology. Moreover, the FeNi films compositions are found to depend on the porous silicon microstructure. Finally, the XRD spectra of the deposited films show the presence of FeNi (111) and FeNi (220) peaks. The FeNi (111) peak has been shown for all polarization potentials, in agreement with results reported in the literature.
Keywords :
A. Alloys , B. Chemical synthesis , D. Magnetic properties
Journal title :
Journal of Physics and Chemistry of Solids
Link To Document :