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Title of article :
Engineering nanophase self-assembly with elastic field
Author/Authors :
Lu، Wei نويسنده , , Kim، Dongchoul نويسنده ,
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Abstract :
A binary monolayer on an elastic substrate may separate into two phases, which self-assemble into ordered nanoscale patterns. We apply an elastic field to the substrate to guide the self-assembly process. The effect of arbitrary three-dimensional external loading is found to be characterized by a single two-dimensional parameter - a surface stain field of the substrate. A non-uniform strain field significantly influences the size, shape and orientation of self-assembled features, and may induce the formation of pattern colonies. It is shown that a pattern orientates normal to the strain gradient direction. An applied load anchors the position of a self-assembled pattern relative to the substrate, where a colony boundary resides on the strain gradient region. The work suggests a method of strain field design to make various monolayer patterns for nanofabrication.
Keywords :
Self-organization and patterning , Nanostructure , Spinodal Decomposition , Phase-field models
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