Record number :
1001143
Title of article :
Crystallization of hydrogenated amorphous silicon–carbon films by means of laser treatments
Author/Authors :
G. Ambrosone، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
6
From page :
471
To page :
476
Abstract :
Laser annealing of hydrogenated amorphous silicon–carbon films with carbon content, x = C/(C + Si), ranging from 0.08 to 0.28, deposited on Corning glass, has been carried out by a pulsed frequency doubled Nd:YAG (532 nm) laser and a pulsed KrF excimer (248 nm) laser using a fluence of 242 mJ/cm2. The results show that the laser radiation of 532 nm induces in the samples only the growth of silicon crystallites and the degree of crystallinity decreases with increasing x. In the laser treated films at 248 nm, the degree of crystallinity is enhanced with x and cubic SiC crystallites are detectable in samples with x 0.18. Dark conductivity decreases with x for Nd:YAG laser treated films, while it is approximately constant for KrF laser treated ones. The effects of laser annealing on the crystallization process appear to be correlated with the optical properties of the as deposited films.
Keywords :
Crystallization , Silicon–carbon alloys , Pulsed laser treatment
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
2005
Link To Document :
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