Record number :
Title of article :
(Zr, Sn)TiO4 thin films for application in electronics
Author/Authors :
M. Nistor، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
From page :
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Abstract :
Thin films of zirconium tin titanate, (Zr0.8Sn0.2)TiO4 (ZST) were deposited using a pulsed electron beam source based on a channel-spark discharge for target ablation. An advanced degree of crystallization was obtained for the films deposited on alumina substrate post-annealed at 1000 8C. The crystalline lattice constants of the films are very close to those of the target material, which confirms the same stoichiometry in ZST films and in the bulk.
Keywords :
Zirconium tin titanate , Pulsed electron deposition , thin films
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
Link To Document :