Record number :
1000994
Title of article :
Laser conditioning and multi-shot laser damage accumulation effects of HfO2/SiO2 antireflective coatings
Author/Authors :
Yuanan Zhao*، نويسنده , , Tao Wang، نويسنده , , Dawei Zhang، نويسنده , , Jianda Shao، نويسنده , , Zhengxiu Fan، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
5
From page :
335
To page :
339
Abstract :
Laser conditioning effects of the HfO2/SiO2 antireflective (AR) coatings at 1064 nm and the accumulation effects of multishot laser radiation were investigated. The HfO2/SiO2 AR coatings were prepared by E-beam evaporation (EBE). The singleshot and multi-shot laser induced damage threshold was detected following ISO standard 11254-1.2, and the laser conditioning was conducted by three-step raster scanning method. It was found that the single-shot LIDTand multi-shot LIDTwas almost the same. The damage mostly >80% occurred in the first shot under multi-shot laser radiation, and after that the damage occurring probability plummeted to <5%. There was no obvious enhancement of the laser damage resistance for both the single-shot and multi-shot laser radiation of the AR coatings after laser conditioning. A Nomarski microscope was employed to map the damage morphology, and it found that the damage behavior is defect-initiated for both unconditioned and conditioned samples.
Keywords :
DEFECT , Damage morphology , Antireflective coatings , Laser conditioning , Single-shot , Multi-shot , Accumulation effects , Laser-induced damage threshold
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
2005
Link To Document :
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