Record number :
1000920
Title of article :
Atomic layer deposition in porous structures: 3D photonic crystals
Author/Authors :
J.S. King، نويسنده , , D. Heineman، نويسنده , , E. Graugnard، نويسنده , , C.J. Summers، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
6
From page :
511
To page :
516
Abstract :
This paper reports recent results from studies of atomic layer deposition for the infiltration of three-dimensional photonic crystals. Infiltration of ZnS:Mn and TiO2 are reported for SiO2-based opal templates. It has been demonstrated that high filling fractions can be achieved and that the infiltrated material can be of high crystalline quality as assessed by photoluminescence measurements. The highly conformal and uniform coatings obtained in these studies are shown to contribute significantly to the photonic band gap properties. These investigations show the advantages of atomic layer deposition (ALD) as a flexible and practical pathway for attaining high performance photonic crystal structures and optical microcavities
Keywords :
Three-dimensional photonic crystals , Optical microcavities , Photonic band gap properties , Photoluminescence
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
2005
Link To Document :
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