Record number :
1000891
Title of article :
Growth and characterization of Zn1 xCdxO films using remote plasma MOCVD
Author/Authors :
Junji Ishihara، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
4
From page :
381
To page :
384
Abstract :
Zn1 xCdxO films were successfully grown by remote plasma enhanced metalorganic chemical vapor deposition (RPEMOCVD) with diethyl zinc, dimethyl cadmium, and oxygen plasma. The Cd composition x in the Zn1 xCdxO films was tuned by changing a flow rate of group-II sources. With increasing the Cd composition x, the crystal structure was changed from wurzite (WZ) to rock-salt (RS). The optical band-gap of the Zn1 xCdxO films with the wurzite structure up to x 0.7 varied from 3.3 eV down to 1.9 eV.
Keywords :
Remote plasma enhanced metalorganic chemical vapor deposition , Zn1 xCdxO , Dimethyl cadmium , Diethyl zinc
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
2005
Link To Document :
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