Record number :
1000874
Title of article :
Electrical properties of diamond p–i–p structures at high electric fields
Author/Authors :
M. Yamamoto*، نويسنده , , T. Watanabe، نويسنده , , M. Hamada، نويسنده , , T. Teraji I، نويسنده , , T. Ito، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
4
From page :
310
To page :
313
Abstract :
Using photo-lithography and plasma etching processes, we have fabricated high-field-applicable diamond p–i–p structures. Current–voltage (I–V) characteristics of devices thus fabricated, revealed rapid increases in current due to substantial impact excitations, whereas space-charge-limited currents such as I / V2 were observed at sufficiently high electric fields. There were substantial differences in I–V and electroluminescence (EL) properties observed above 1 106 V/cm between N-contained high-temperature/high-pressure-synthesized diamond and undoped chemical-vapor-deposited (CVD) diamond, indicating that these characteristics strongly depend on the Fermi level of the diamond i layer employed. Cathodoluminescence data were also compared with the EL data.
Keywords :
Fowler–Nordheim relation , diamond , high electric field , p–i–p structure
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
2005
Link To Document :
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