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Title of article :
In situ X-ray diffraction study of crystallization process of GeSbTe thin films during heat treatment
Author/Authors :
Naohiko Kato*، نويسنده , , Ichiro Konomi، نويسنده , , Yoshiki Seno، نويسنده , , Tomoyoshi Motohiro، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
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Abstract :
The crystallization processes of theGe2Sb2Te5 thin filmused forPDandDVD-RAMwere studied in its realistic optical disk film configurations for the first time byX-ray diffraction using an intenseX-ray beamof a synchrotron orbital radiation facility (SPring- 8) and in situ quick detection with a Position-Sensitive-Proportional-Counter. The dependence of the amorphous-to-fcc phasechange temperature T1 on the rate of temperature elevation Ret gave an activation energy Ea: 0.93 eV much less than previously reported 2.2 eVobtained from a model sample 25–45 times thicker than in the real optical disks. The similar measurement on the Ge4Sb1Te5 film whose large reflectance change attains the readability by CD-ROM drives gave Ea: 1.13 eV with larger T1 than Ge2Sb2Te5 thin films at any Ret implying a lower sensitivity in erasing as well as a better data stability of the phase-change disk
Keywords :
amorphous , synchrotron radiation , X-ray diffraction , GeSbTe thin film , Phase-change , Crystallization
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
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Link To Document :