Record number :
1000843
Title of article :
Photoemission spectroscopy study of the oxidation of HfC(1 0 0)
Author/Authors :
K. Edamoto، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
4
From page :
174
To page :
177
Abstract :
The oxidation process of an HfC(1 0 0) surface has been investigated using photoemission spectroscopy utilizing synchrotron radiation. It is found that, when the HfC(1 0 0) surface is exposed to O2 at room temperature, the C atoms of the surface region react with oxygen to form CO molecules and are desorbed from the substrate. The Hf atoms of the surface region are oxidized by stepwise reactions, and are finally oxidized to form an HfO2-like layer at high coverages (>10 L).
Keywords :
Photoelectron spectroscopy , adsorption , Oxidation , HFC
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
2005
Link To Document :
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