Record number :
1000822
Title of article :
Optical effects in silica glass during implantation of 60 keV Cu ions
Author/Authors :
O.A. Plaksin، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
5
From page :
79
To page :
83
Abstract :
Spectra of the optical transmission and ion-induced photon emission (IIPE) of silica glass were measured during implantation of 60 keV Cu ions at ion fluxes from 1 to 75 mA/cm2 up to a fluence of 2 1017 ions/cm2, aimed at monitoring the formation of Cu nanoparticles. The precipitation threshold of Cu atoms is flux-dependent. At fluxes from 1 to 10 mA/cm2, the formation of nanoparticles is efficient up to fluences of 2 1017 ions/cm2. The efficiency of IIPE of Cu+ solutes in silica glass (band at 2.25 eV) is proportional to a total concentration of Cu solutes. In a single-phase region (solid solution of Cu atoms), the efficiency of IIPE of Cu+ solutes is flux-independent. In a two-phase region (solid solution and Cu nanoparticles), the dynamic balance between the nanoparticles and Cu solutes determines the flux-dependent behavior of the efficiency of IIPE.
Keywords :
Silica glass , In situ optical transmission , Ion-induced photon emission , Heavy-ion implantation , metal nanoparticles
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
2005
Link To Document :
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