Record number :
1000781
Title of article :
High laser-induced damage threshold HfO2 films prepared by ion-assisted electron beam evaporation
Author/Authors :
Dawei Zhang، نويسنده , , Shuhai Fan، نويسنده , , Yuanan Zhao*، نويسنده , , Weidong Gao، نويسنده , , Jianda Shao، نويسنده , , Ruiying Fan، نويسنده , , Yingjian Wang، نويسنده , , Zhengxiu Fan، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
6
From page :
232
To page :
237
Abstract :
HfO2 films were deposited by electron beam evaporation with different deposition parameters. The properties such as refractive index, weak absorption, and laser induced damage thresholds (LIDTs) of these films have been investigated. It was found that when pulsed Nd:YAG 1064 nm laser is used to investigate LIDT of films: Metallic character is the main factor that influences LIDTs of films obtained from Hf starting material by ion-assisted reaction, and films prepared with higher momentum transfer parameter P have fewer metallic character; The ion-assisted reaction parameters are key points for preparing high LIDT films and if the parameters are chose properly, high LIDT films can be obtained
Keywords :
Weak absorption , Laser-induced damage threshold , HfO2 films , Ion-assisted reaction
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
2005
Link To Document :
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