Record number :
Title of article :
The deepness enhancing of an AFM-tip induced surface nanomodification
Author/Authors :
D.V. Sheglov، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
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Abstract :
The novel method of the semiconductor nanostructuring (TINE&MEMO) has been developed on the base of the simultaneous AFM-tip induced local anodic oxidation and mechanical modification of the surface under the applying of advanced electric potentials. The TINE&MEMO-based technology allows obtaining the principle new scale of the depth up to 100 nm for the nanostructure fabrication with a low aspect relation between the width and deepness. The developed nanoscale AFM-lithography has been clearly demonstrated on titanium, gallium arsenide and silicon substrates for creation of electronic nanodevices.
Keywords :
AFM , Nanostructuring , Local anodic oxidation , Surface nanomodification
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
Link To Document :