Record number :
1000747
Title of article :
Annealing effects on electron-beam evaporated Al2O3 films
Author/Authors :
Shang Shuzhen*، نويسنده , , Yu-Chen Lei، نويسنده , , Hou Haihong، نويسنده , , Yi Kui، نويسنده , , Fan Zhengxiu، نويسنده , , Shao Jianda، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
6
From page :
437
To page :
442
Abstract :
The effects of post-deposited annealing on structure and optical properties of electron-beam evaporated Al2O3 single layers were investigated. The films were annealed in air for 1.5 h at different temperatures from 250 to 400 8C. The optical constants and cut-off wavelength were deduced. Microstructure of the samples was characterized by X-ray diffraction (XRD). Profile and surface roughness measurement instrument was used to determine the rms surface roughness. It was found that the cut-off wavelength shifted to short wavelength as the annealing temperature increased and the total optical loss decreased. The film structure remained amorphous even after annealing at 400 8C temperature and the samples annealed at higher temperature had the higher rms surface roughness. The decreasing total optical loss with annealing temperature was attributed to the reduction of absorption owing to oxidation of the film by annealing. Guidance to reduce the optical loss of excimer laser mirrors was given
Keywords :
annealing , ultraviolet , Optical loss , Microstructure , Al2O3
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
2005
Link To Document :
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