Record number :
1000716
Title of article :
Influence of hydrogen and oxygen plasma treatment on field emission characteristics of boron nitride thin films
Author/Authors :
Weiqing Li، نويسنده , , Guangrui Gu، نويسنده , , Yingai Li، نويسنده , , Zhi He، نويسنده , , Lihua Liu، نويسنده , , Chunhong Zhao، نويسنده , , Yongnian Zhao*، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
5
From page :
207
To page :
211
Abstract :
Boron nitride (BN) nanometer films are synthesized on Si(1 0 0) substrates by RF reactive magnetron sputtering. The surfaces of BN films are treated with hydrogen and oxygen plasma, respectively and studied by Fourier transform infrared (FTIR) spectra, atomic force microscopic (AFM) and field emission characteristics. The results show that the surface negative electron affinity (NEA) of the films is increased, the threshold field reduced and the emission current increased due to hydrogen plasma treatment. The effect of oxygen plasma treatment on field emission characteristics of BN films is obscure. The result shows that only the emission current is slightly decreased due to the surface oxidation of BN films.
Keywords :
Hydrogen and oxygen plasma , Threshold electric fields , BN films , Field emission , Emission current , Surface treatment
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
2005
Link To Document :
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