Record number :
1000670
Title of article :
Dry etching of surface textured zinc oxide using a remote argon–hydrogen plasma
Author/Authors :
R. Groenen، نويسنده , , M. Creatore، نويسنده , , M.C.M. van de Sanden، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
5
From page :
321
To page :
325
Abstract :
A new method for fast dry etching of inherently textured ZnO using a remote argon–hydrogen plasma created by a cascaded arc is presented, obtaining etch rates over 10 nm/s. Atomic hydrogen is considered to be the reactive species responsible for the etching process, the excess of molecular hydrogen in the gas phase does not contribute to the etching. Furthermore, using in situ spectroscopic ellipsometry (sub-) surface film modification competitive to etching is observed
Keywords :
Zinc oxide , Surface modification , Remote plasma
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
2005
Link To Document :
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