Record number :
1000656
Title of article :
Microstructures and IR spectra of long amorphous SiO2/Si nanowires
Author/Authors :
T. Noda ، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
5
From page :
231
To page :
235
Abstract :
Long Si nanowires were tried to form using a thermal gradient evaporation method. Amorphous SiO2/Si nanowires longer than 6 mm were formed at 1403–1433 K. The long nanowires consist of a silicon single core of 50–100 nm in diameter and an amorphous SiO2 outer layer of 10–15 nm in thickness. The growth direction of the long Si nanowires was h1 1 1i. The nanowires showed IR absorption peaks at 1130, 1160 and 1200 cm 1 due to the disordered structure of SiO2/Si nanowires.
Keywords :
Amorphous SiO2/Si nanowires , Thermal gradient evaporation method , IR spectrum
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
2005
Link To Document :
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