Record number :
Title of article :
Sub-micron scale patterning using femtosecond laser and self-assembled monolayers interaction
Author/Authors :
Wonseok Chang*، نويسنده , , Moojin Choi، نويسنده , , Jaegu Kim and Suckjoo Na، نويسنده , , Sunghak Cho، نويسنده , , Kyunghyun Whang، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
From page :
To page :
Abstract :
Standard positive photoresist techniques were adapted to generate sub-micron scale patterns of gold substrate using selfassembled monolayers (SAMs) and femtosecond laser. Self-assembled monolayers formed by the adsorption of alkanethiols onto gold substrate are employed as very thin photoresists. The process underlying photopatterning of SAMs on gold is wellknown at the phenomenological level. Alkanethiolates formed by the adsorption of alkanethiols are oxidized on exposure to UV light in the presence of air to alkylsulfonates. Specifically, it is known that deep UV light of wavelength less than 200 nm is necessary for oxidation to occur. In this study, solid state femtosecond laser of wavelength 800 nm is applied for photolithography. The results show that ultrafast laser of near infrared (NIR) range wavelength can replace deep UV laser source for photopatterning using thin organic films. The essential basis of our approach is the photochemical excitation of specific reactions in a particular functional group (in this case a thiolate sulfur atom) distributed with monolayer coverage on a solid surface. Femtosecond laser photolithography could be applied to fabricate the patterning of surface chemical structure and the creation of three-dimensional nanostructures by combination with suitable etching methods.
Keywords :
Femtosecond laser patterning , Self-assembled monolayer , Photodecomposition , photooxidation
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
Link To Document :