J. Jiang*، نويسنده , , B.Y. Jiang، نويسنده , , C.X. Ren، نويسنده , , Y. T. Feng، نويسنده , , X. Wang، نويسنده , , X.H. Liu، نويسنده , , S.C. Zou، نويسنده ,
Hf was deposited onto the surface of molybdenum grids by ion beam assisted deposition (IBAD). The electron emission
characteristics from molybdenum grids with and without Hf, which were contaminated by active electron emission substances
(Ba, BaO) of the cathode, were measured using an analogous diode method. The results show that electron emission from the
grid coated with Hf film was less than that from molybdenum grid without Hf. The mechanism for electron emission suppression
of the grids coated with Hf film was discussed.