Record number :
1000542
Title of article :
Chemical alteration of poly(vinyl fluoride) Tedlar by hyperthermal atomic oxygen
Author/Authors :
Gar B. Hoflund*، نويسنده , , Michael L. Everett، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
9
From page :
367
To page :
375
Abstract :
In this study the erosion of poly(vinyl fluoride) Tedlar by hyperthermal atomic oxygen (AO) has been examined using X-ray photoelectron spectroscopy (XPS). Initially the Tedlar film had F/C and O/C atom ratios of 0.45 and 0.11, which decrease to 0.018 and 0.04, respectively, after a 2-h exposure to a flux of 2 1015 atoms/cm2 s AO with an average kinetic energy of 5 eV. This exposure essentially produced a graphitic or amorphous carbon-like layer with a carbon content greater than 90 at.%. Longer AO exposures do not alter the composition of this layer significantly. Exposure to O2 or air nearly doubles the oxygen content in the near-surface region. This is due to dissociative oxygen adsorption at reactive sites formed at the polymer surface during AO exposure. Further exposure to AO removes this chemisorbed oxygen.
Keywords :
Low Earth Orbit , Teflon , Tedlar , Tefzel , XPS , Ao , fluoropolymers , Fluoromers , LEO
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
2005
Link To Document :
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