Record number :
Title of article :
The critical layer number of epitaxially grown Cu and Ni films with strained structure
Author/Authors :
J.C. Li، نويسنده , , W. Liu، نويسنده , , Q. Jiang، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
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Abstract :
The thickness dependent structural transition of epitaxially grown thin films from a tetragonal structure to the corresponding bulk structure is thermodynamically considered. It is found that there exists a competition between elastic energy of the tetragonal structure and film–substrate interface energy. Equilibrium between these energies is present at a critical layer number nc. The predictions for nc are in agreement with the experimental results of some different metallic films deposited on fcc metallic substrates
Keywords :
Interface energy , Metallic film , Elastic energy , Critical thickness
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
Link To Document :