Record number :
1000444
Title of article :
Deposition of 10-undecenoic acid self-assembled layers on H–Si(1 1 1) surfaces studied with AFM and FT-IR
Author/Authors :
Y.J. Li، نويسنده , , R. Tero، نويسنده , , Herbert T. Nagasawa، نويسنده , , T. Nagata، نويسنده , , T. Urisu، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Pages :
4
From page :
238
To page :
241
Abstract :
Self-assembling layers of 10-undecenoic acid (UA) were deposited on H-terminated Si(1 1 1) surfaces and characterized with atomic force microscopy (AFM) and Fourier-transform infrared (FT-IR) spectroscopy measurements for the first time. The unique island structures are deposited by layer-by-layer growth mechanism. The IR spectra suggest that the multilayers grown over the first monolayer are deposited by weak intermolecular interactions such as Van der Waals force and hydrogen bonding
Keywords :
AFM , Si(1 1 1) , FT-IR , 10-Undecenoic acid , Self-assembled layers
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
2004
Link To Document :
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