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Title of article :
Surface study and thickness control of thin Al2O3 film on Cu–9%Al(111) single crystal
Author/Authors :
Yasuhiro Yamauchi، نويسنده , , Michiko Yoshitake )، نويسنده , , Weijie Song a، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Pages :
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Abstract :
We were successful in growing a uniform flat Al2O3 film on the Cu–9%Al(111) surface using the improved cleaning process, low ion energy and short time sputtering. The growth of ultra-thin film of Al2O3 on Cu–9%Al was investigated using Auger electron spectroscopy (AES) and a scanning electron microscope (SEM). The Al2O3 film whose maximum thickness was about 4.0 nm grew uniformly on the Cu–9%Al surface. The Al and O KLL Auger peaks of Al2O3 film shifted toward low kinetic energy, and the shifts were related to Schottky barrier formation and band bending at the Al2O3/Cu–9%Al interface. The thickness of Al2O3 film on the Cu–9%Al surface was controlled by the oxygen exposure
Keywords :
Epitaxial Al2O3 thin film , Film thickness control , Cu–9%Al(111) single crystal , Auger electron spectroscopy , Oxidation
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
Link To Document :