Record number :
1000149
Title of article :
A spectroscopic study distinguishing between chemical phase separation with different degrees of crystallinity in Hf(Zr) silicate alloys
Author/Authors :
G. Lucovsky*، نويسنده , , G.B Rayner، نويسنده , , D. Kang، نويسنده , , C.L. Hinkle، نويسنده , , J.G. Hong، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Pages :
5
From page :
429
To page :
433
Abstract :
Chemical phase separation at device processing temperatures is an important issue for integration of Zr and Hf silicates alloys into advanced complementary metal oxide semiconductor (CMOS) devices. Chemical phase separation into ZrO2 and SiO2 has been detected by different spectroscopic techniques, including Fourier transform infrared, X-ray photoelectron, and X-ray absorption spectroscopy, as well as X-ray diffraction and high resolution transmission electron microscopy imaging as well. Comparisons between these techniques for Zr silicates identify an unambiguous approach to distinguishing between chemical phase separation with different degrees of micro- and nano-crystallinity. # 2004 Elsevier B.V. All rights reserved
Keywords :
Chemical phase separation , Nano-crystalline phases , HIGH-K DIELECTRICS
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
2004
Link To Document :
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