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Title of article :
Enhanced tunneling in stacked gate dielectrics with ultra-thin HfO2 layers sandwiched between thicker SiO2 layers
Author/Authors :
C.L. Hinkle، نويسنده , , C. Fulton، نويسنده , , R.J. Nemanich Chair، نويسنده , , G. Lucovsky، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Pages :
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Abstract :
There has been a search for alternative dielectrics with significantly increased dielectric constants, K, which increases physical thickness in proportion to K, and therefore would significantly reduce direct tunneling. However, increases in K to values of 15–25 in transition metal and rare earth oxides are generally accompanied by decreases in the conduction band offset energy with respect to Si, EB, and the effective electron tunneling mass, meff, which mitigate gains from increased thickness. A novel technique, based on stacked dielectrics, is used to obtain the tunneling mass-conduction band offset energy product. When combined with optical measurements of tunneling barriers, this yields direct estimates of the tunneling mass. # 2004 Published by Elsevier B.V.
Keywords :
Direct tunneling , Stacked gate dielectrics , Tunneling mass-conduction band offset energy product , HIGH-K DIELECTRICS
Journal title :
Applied Surface Science
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Link To Document :