Record number :
1000047
Title of article :
SiC nanofibers grown by high power microwave plasma chemical vapor deposition
Author/Authors :
Shin-ichi Honda، نويسنده , , Yang-Gyu Baek، نويسنده , , Takashi Ikuno، نويسنده , , Hidekazu Kohara، نويسنده , , Mitsuhiro Katayama، نويسنده , , Kenjiro Oura، نويسنده , , Takashi Hirao، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Pages :
5
From page :
378
To page :
382
Abstract :
Silicon carbide (SiC) nanofibers have been synthesized on Si substrates covered by Ni thin films using high power microwave chemical vapor deposition (CVD). Characterization using transmission electron microscopy (TEM) combined with electron energy-dispersive X-ray spectroscopy (EDX) revealed that the resultant fibrous nanostructures were assigned to β-SiC with high crystallinity. The formation of SiC nanofibers can be explained by the vapor liquid solid (VLS) mechanism in which precipitation of SiC occurs from the supersaturated Ni nanoparticle containing Si and C.
Keywords :
SiC nanofibers , Microwave plasma CVD , VLS mechanism , Anisotropic etching
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
Serial Year :
2003
Link To Document :
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